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Clean Room

The Chemistry Cleanroom Facility in the Department of Chemistry provides a Class 1000/ISO Class 6 environment and contains many of the same types of resources found in semiconductor cleanrooms. This includes, Semiconductor photolithography, patterning and wet etching capabilities, Physical Vapor Deposition of metals and Reactive Ion Etching of substrates.

The equipment available for general use includes the following:

With this equipment, the facility is capable of producing very fine features on the order of 0.7 microns.

In addition, we have space that can be dedicated to directed research requiring clean space with an exhausted laminar flow bench.

Training is available for most aspects of cleanroom use as well as the instrumentation housed in the cleanroom.

Contact Paul Lee
(520) 626-2942 or
to discuss how the Dept. of Chemistry Cleanroom can enhance your research.